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[Analysis Case] Evaluation of Work Function After Thin Film Surface Treatment

UPS analysis after surface plasma treatment of ITO.

In semiconductor devices, their performance is greatly influenced by the combination of work functions of various materials that make up the device. Therefore, attempts have been made to control the work function through surface treatments and modifications, and it is important to verify their effects. This document presents an example of evaluating the change in work function of ITO (Sn-doped In2O3), used as an electrode material in organic ELs and solar cells, before and after surface plasma treatment using UPS analysis.

• Company：一般財団法人材料科学技術振興財団　MST
• Price：Other

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